Study on UV Imprinting and Optical Properties of Micro-pyramid Arrays Film
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摘要: 采用UV压印固化成型的方法制备具疏水性的微棱锥阵列减反薄膜,并设计正交试验探究了各工艺对其微观结构成型的影响,得到复形度高的微棱锥阵列薄膜的优化方案(压强0.5~0.8 MPa,充型时间30 s,光固化时间1 min)。通过对其减反性能分析,所制备的微棱锥阵列薄膜比无织构的平膜加权反射率低5%,分析各影响因素发现抑制气泡缺陷,并控制微棱锥特征结构参数高度和侧面夹角精度可使微织构薄膜减反能力相比提高21%,同时织构膜水滴接触角表明其具有自洁性。Abstract: The thin films with hydrophobicity of micro-pyramid arrays were fabricated with the UV(Ultraviolet) imprinting method, and the orthogonal experiments were designed to explore the effect of the each process on the microstructure forming, an optimized plan (pressure 0.5 ~ 0.8 MPa, forming time 30 s, curing time 1 min) of micro-pyramid array film with high integrity was obtained. Through the analysis of its anti-reflection performance, the prepared micro-pyramid array film had a weighted reflectivity of 5% lower than that of the non-textured film. By analyzing the various influencing factors, it is found that the suppression of bubble defects, and control of the micro-pyramid characteristic structure parameter height and side angle accuracy could increase the anti-reflection ability of the micro-textured film by 21%, while the contact angle of water drop on the textured film indicated that it has the self-cleaning properties.
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Key words:
- micro-pyramid arrays /
- UV imprinting /
- microstructure thin film /
- reflectance /
- hydrophobicity
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表 1 UV压印三因素三水平正交试验表
参数 水平1 水平2 水平3 压强P/MPa 0.2 0.5 0.8 光固化时间t/min 1 2 3 充型时间t0/s 30 10 60 表 2 正交试验结果及各指标值
试验号 加工参数 特征结构参数 气泡率/% P/MPa t/min t0/s 高度h/μm 侧面夹角α/(°) 1 0.2 1 30 67.3 69.6 35.9 2 0.2 2 10 62.1 74.2 77.5 3 0.2 3 60 63.2 75.5 85.6 4 0.5 1 60 69.9 70.0 25.3 5 0.5 2 30 66.8 68.8 46.8 6 0.5 3 10 68.9 69.4 26.8 7 0.8 1 10 64.2 72.1 57.7 8 0.8 2 60 63.9 72.6 75.8 9 0.8 3 30 70.1 70.8 23.8 表 3 极差R分析表
指标 A压强P/MPa B光固化时间t/min 空列 C充型时间t0/s 高度h 4.3 2.8 2.6 3.0 夹角α差值 2.1 1.5 1.4 1.6 因素主次 A>C>B -
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