Optimization of Polishing Process Parameters for Surface Roughness and Residual Stress of GH4169 Blade with Abrasive Cloth Wheel
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摘要: 为获得理想的GH4169抛光表面粗糙度和表面残余应力，提出了面向多目标的抛光工艺参数优选区间划分方法，设计了五因素三水平抛光正交试验；根据试验结果标准差计算了工艺参数对各优化目标影响的权重系数，并将多优化目标变换为综合优化目标；通过趋势图分析了各个优化目标随工艺参数增大的变化机理及趋势；按照所提方法确定了工艺参数优选区间，并通过实验进一步验证了优选区间的可靠性。Abstract: In order to obtain the ideal polishing surface roughness and polishing surface residual stress of GH4169, a double objective optimal interval division method for polishing process parameters was proposed, and five-factor three-level polishing orthogonal test was designed; According to the standard deviation of the test results, the influence weight coefficients of the process parameters on the optimization objectives were calculated, and multiple optimization objectives were transformed into a comprehensive optimization objective. The change mechanisms and trends of the optimization objectives with the increasing of process parameters were analyzed via tendency chart. The optimal process parameters were determined by using the proposed method, and its reliability was further verified via an experiment.
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Key words:
- abrasive cloth wheel /
- polishing /
- GH4169 /
- double optimization objectives /
- process parameters /
- optimization
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表 1 抛光工艺参数
水平 ω /(r·min-1) p /mm ap /mm vf/(mm·min-1) P/# 0 4 500 0.7 0.6 320 80 1 6 000 1.2 0.9 220 200 2 7 500 1.7 1.2 120 320 
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表 2 试验结果
ω(r·min-1) p/mm ap/mm vf/(mm·min-1) P/# Ra/μm y1* σ/MPa y2* Y 4 500 0.7 0.6 320 80 0.693 0.622 -218.08 0.603 0.613 4 500 1.2 0.9 220 200 0.42 0.300 -315.84 0.174 0.240 4 500 1.7 1.2 120 320 0.369 0.240 -135.36 0.744 0.482 6 000 0.7 0.6 220 200 0.366 0.237 -180.72 0.601 0.411 6 000 1.2 0.9 120 320 0.228 0.074 -117.68 0.800 0.423 6 000 1.7 1.2 320 80 0.498 0.392 -267.52 0.326 0.361 7 500 0.7 0.9 320 320 0.189 0.028 -122.16 0.786 0.392 7 500 1.2 1.2 220 80 1.014 1.000 -171.44 0.630 0.822 7 500 1.7 0.6 120 200 0.516 0.413 -370.8 0.000 0.215 4 500 0.7 1.2 120 200 0.378 0.251 -257.44 0.358 0.302 4 500 1.2 0.6 320 320 0.336 0.201 -179.92 0.603 0.394 4 500 1.7 0.9 220 80 0.978 0.958 -313.28 0.182 0.585 6 000 0.7 0.9 120 80 0.465 0.353 -229.52 0.447 0.398 6 000 1.2 1.2 320 200 0.354 0.223 -192.24 0.564 0.387 6 000 1.7 0.6 220 320 0.39 0.265 -173.52 0.624 0.437 7 500 0.7 1.2 220 320 0.165 0.000 -127.48 0.769 0.369 7 500 1.2 0.6 120 80 0.348 0.216 -336.88 0.107 0.164 7 500 1.7 0.9 320 200 0.546 0.449 -188.4 0.576 0.510 6 000 1.2 0.9 220 200 0.411 0.290 -151.12 0.694 0.484 6 000 1.2 0.9 220 200 0.366 0.237 -161.84 0.660 0.440 6 000 1.2 0.9 220 200 0.525 0.424 -177.12 0.612 0.514 6 000 1.2 0.9 220 200 0.342 0.208 -179.54 0.605 0.399 6 000 1.2 0.9 220 200 0.375 0.247 -211.02 0.505 0.371 6 000 1.2 0.9 220 200 0.417 0.297 -154.72 0.683 0.482
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表 3 优化区间及各目标取值范围
参数 优选区间 取值范围 Y Ra/μm σ/MPa n/(r·min-1) [6000, 7500] 0.412~0.426 0.316~0.370 -274.4~-228.8 p/mm [0.7, 1.2] 0.414~0.427 0.301~0.342 -244.7~-236.5 ap/mm [0.6, 0.9] 0.372~0.436 0.351~0.353 -304.2~-241.9 vf/(mm·min-1) [120, 220] 0.331~0.463 0.307~0.385 -301.6~-241.4 P/# [320, 600] 0.396~0.416 0.224~0.334 -264.7~-178.3
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表 4 试验工艺参数
编号 优化对象 ω/(r·min-1) p/mm ap/mm vf/(mm·min-1) P/# A Ra/μm 6 000 0.7 0.9 120 600 B σ/MPa 4 500 1.7 0.6 120 80 C Y 7 500 0.7 0.6 120 320 D Y 7 000 1.0 7.5 190 400 E Y 6 000 0.7 0.6 120 320 F Y 7 500 1.2 0.9 220 600
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表 5 实验结果
编号 Ra/μm σx/MPa Y A 0.324 -238.7 0.481 B 0.417 -314.2 0.530 C 0.335 -277.4 0.316 D 0.341 -261.7 0.437 E 0.326 -251.4 0.419 F 0.315 -251.8 0.359
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