退火时间对Cu-Al-O薄膜性能影响的研究

高倩倩; 刘正堂; 冯丽萍; 田浩

退火时间对Cu-Al-O薄膜性能影响的研究

1.
西北工业大学材料学院凝固技术国家重点实验室, 西安 710072

基金项目:

航空科学基金项目(2008ZF53058)

凝固技术国家重点实验室(NWPU)(58-TZ-2011)资助

详细信息

作者简介:
高倩倩(1986-),硕士研究生,研究方向为薄膜制备与性能研究,elegance268@163.com;刘正堂,教授，硕士,liuzht@nwpu.edu.cn

高倩倩(1986-),硕士研究生,研究方向为薄膜制备与性能研究,elegance268@163.com;刘正堂,教授，硕士,liuzht@nwpu.edu.cn

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出版历程
- 收稿日期: 2012-02-23

Effect of Annealing Time on Properties of Cu-Al-O Thin Film

1.
State Key Lab of Solidification Processing, College of Materials Science and Engineering, Northwestern Polytechnical University, Xi'an, 710072

摘要

摘要: 通过制备Cu-Al-O薄膜并对其进行退火处理,研究了退火时间对薄膜形貌、结构以及紫外-可见透过率、带隙、中红外透过率的影响。研究结果表明:随着退火时间的增加,薄膜开始晶化,5.0 h时薄膜中出现裂纹,同时出现AlCu合金相;紫外-可见透过率随退火时间的增加而降低;中红外透过率随退火时间的增加先增加后降低;Cu-Al-O薄膜的直接带隙随退火时间的增加而降低。
- Cu-Al-O薄膜 /
- 退火时间 /
- 透过率
Abstract: The effect of annealing time on morphology,structure,ultraviolet-visible transmittance,band gap andmid-infrared transmittance of Cu-Al-O thin films was investigated by preparing and annealing the films. The resultsshow that crystallization appears with the increasing of annealing time while cracks exists and AlCu phase arises inCu-Al-O thin film annealed for 5. 0 h. The ultraviolet-visible transmittance decreases with increasing annealingtime. Mid-infrared transmittance increases initially and then decreases with the increasing of annealing time. Be-sides,the direct band gap of Cu-Al-O thin films decreases with the increasing of annealing time.
- Cu-Al-O thin films /
- annealing time /
- transmittance

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参考文献(12)

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