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面曝光固化快速成型曝光时间的参数优化研究

钱波 陈子龙 王明义 李腾飞

钱波, 陈子龙, 王明义, 李腾飞. 面曝光固化快速成型曝光时间的参数优化研究[J]. 机械科学与技术, 2018, 37(2): 313-317. doi: 10.13433/j.cnki.1003-8728.2018.0224
引用本文: 钱波, 陈子龙, 王明义, 李腾飞. 面曝光固化快速成型曝光时间的参数优化研究[J]. 机械科学与技术, 2018, 37(2): 313-317. doi: 10.13433/j.cnki.1003-8728.2018.0224
Qian Bo, Chen Zilong, Wang Mingyi, Li Tengfei. Optimization Study on Exposure Time for Mask Projection Stereolithography System[J]. Mechanical Science and Technology for Aerospace Engineering, 2018, 37(2): 313-317. doi: 10.13433/j.cnki.1003-8728.2018.0224
Citation: Qian Bo, Chen Zilong, Wang Mingyi, Li Tengfei. Optimization Study on Exposure Time for Mask Projection Stereolithography System[J]. Mechanical Science and Technology for Aerospace Engineering, 2018, 37(2): 313-317. doi: 10.13433/j.cnki.1003-8728.2018.0224

面曝光固化快速成型曝光时间的参数优化研究

doi: 10.13433/j.cnki.1003-8728.2018.0224
基金项目: 

北京市自然科学基金项目(3132007)与国家自然科学基金项目(21206152)资助

详细信息
    作者简介:

    钱波(1979-),副教授,博士,研究方向为材料成型领域内增材制造方向材料成型装备与工艺,qianbo@ecust.edu.cn

Optimization Study on Exposure Time for Mask Projection Stereolithography System

  • 摘要: 面曝光快速成型是光固化成型领域快速高速发展的一种工艺,曝光时间是成型工艺中的关键参数之一,对于成型质量有直接关系:若曝光时间过短,正在固化的树脂层硬度不够,在重力的的作用下会使其下落,进而影响下层树脂的固化,一层影响一层,最终使得逐层固化的树脂精度不高,导致制件变形较大;若曝光时间过长,正在固化的树脂硬度会比较高,但是其收缩也会比较明显,同时会在固化层和树脂槽之间会产生真空,真空力会使打印金属平台上升时所产生的拉力增大,容易造成固化层脱落遗留在树脂槽中,导致打印物件制造失败。通过比较不同曝光时间下样品的凝胶含量和双键转化率两大指标,确定样品随着曝光时间的增加固化程度也在不断增加;然后通过比较不同曝光时间下样品的拉伸储能模量,发现样品随着曝光时间的增加力学性能也随之增强。通过综合比较固化程度、成型力学性能、成型精度三大因素,确定整体成型最佳曝光时间。通过两个分层试验验证了前述最佳曝光时间的合理性。
  • [1] Jariwala A S, Ding F, Boddapati A, et al. Modeling effects of oxygen inhibition in mask-based stereolithography[J]. Rapid Prototyping Journal, 2011,17(3):168-175
    [2] 胥光申,杨根.面曝光快速成形系统制作工艺参数的优化研究[J].机械科学与技术,2015,34(2):224-228 Xu G S, Yang G. Optimization of the processing parameters of mask projection stereolithography system[J]. Mechanical Science and Technology for Aerospace Engineering, 2015,34(2):224-228(in Chinese)
    [3] 胥光申.用于高精度小尺寸零件制作的光固化快速成型技术的现状与发展[J].机械科学与技术,2004,23(10):1223-1225 Xu G S. A review of rapid prototyping (RP) techniques for small object with high-resolution[J]. Mechanical Science and Technology, 2004,23(10):1223-1225(in Chinese)
    [4] 李东方,陈继民,袁艳萍,等.光固化快速成型技术的进展及与应用[J].北京工业大学学报,2015,41(12):1769-1774 Li D F, Chen J M, Yuan Y P, et al. Development and application of stereo lithography apparatus[J]. Journal of Beijing University of Technology, 2015,41(12):1769-1774(in Chinese)
    [5] Sugavaneswaran M, Arumaikkannu G. Modelling for randomly oriented multi material additive manufacturing component and its fabrication[J]. Materials & Design (1980-2015), 2014,54:779-785
    [6] Li Z Q, Pucher N, Cicha K, et al. A straightforward synthesis and structure-activity relationship of highly efficient initiators for two-photon polymerization[J]. Macromolecules, 2013,46(2):352-361
    [7] Jiang C P, Huang Y M, Liu C H. Dynamic finite element analysis of photopolymerization in stereolithography[J]. Rapid Prototyping Journal, 2006,12(3):173-180
    [8] 王伊卿,贾志洋,赵万华,等.面曝光快速成形关键技术及研究现状[J].机械设计与研究与,2009,25(2):96-100 Wang Y Q, Jia Z Y, Zhao W H, et al. The key technology and research status of mask projection stereolithography[J]. Machine Design and Research, 2009,25(2):96-100(in Chinese)
    [9] Limaye A S, Rosen D W. Compensation zone approach to avoid print-through errors in mask projection stereolithography builds[J]. Rapid Prototyping Journal, 2006,12(5):283-291
    [10] Limaye A S, Rosen D W. Process planning method for mask projection micro-stereolithography[J]. Rapid Prototyping Journal, 2007,13(2):76-84
    [11] Cheng Y L, Li M L, Lin J H, at al. Development of dynamic mask photolithography system[C]//Proceedings of 2005 IEEE International Conference on Mechatronics. Taipei, Taiwan:IEEE, 2005:467-471
    [12] Huang Y M, Lan H Y. CAD/CAE/CAM integration for increasing the accuracy of mask rapid prototyping system[J]. Computers in Industry, 2005,56(5):442-456
    [13] Onuh S O, Hon K K B. Improving stereolithography part accuracy for industrial applications[J]. The International Journal of Advanced Manufacturing Technology, 2001,17(1):61-68
    [14] Zhou J G, Herscovici D, Chen C C. Parametric process optimization to improve the accuracy of rapid prototyped stereolithography parts[J]. International Journal of Machine tools and Manufactures, 2000,40(3):363-397
    [15] 吴懋亮,朱东波,刘贵喜,等.面成型光固化方法研究[J].机械设计与制造,2007,(6):128-130 Wu M L, Zhu D B, Liu G X, et al. A novel plane prototyping method based on stereolithography[J]. Machinery Design & Manufacture, 2007,(6):128-130(in Chinese)
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出版历程
  • 收稿日期:  2016-10-27
  • 刊出日期:  2018-02-25

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